High purity blending and loading technology of toxic and deleterious chemicals.
What We Have
As the latest design rules in semiconductor fabrications enter into ultra-fine Xnm node, it is becoming essential that chemicals used in the process be strictly maintained in a high purity state. HIROTA is capable of removing impurities (positive ions, negative ions, particles, etc.) at PPT (parts-per-trillion) levels from desired chemical compounds, blending and loading while keeping a purified state of chemicals, as well as analysis measures to ensure quality.
What It Brings
Due to eliminated impurities, chemical solutions can work at their utmost functionality while maintaining a high purity state, resulting in preferred cleaning effects and processing results. This technology can serve outside semiconductor industries as well, for example, precision machinery or healthcare industries, where cleaning agents should be manufactured with the least impurities possible.
Why Competitive ?
In Japan, only a few companies in semiconductor industry have the capability of preparing such high purity inorganic chemical solutions. HIROTA has established an operation framework to fulfil diverse product offerings and small-batch manufacturing. Moreover, recent efforts in the application of their technologies to other industries has allowed the wider accumulation of knowledge that has essential in outperforming competitors.
How It Performs
Examples of application:
Speciality acid compounds (titanium-tungsten etchant) for 3D-NAND（as parts for SSD and USB) manufacturing.
Antistatic solution for improved production yield in manufacturing LCD for iPhone.
Chemical solution for cleaning hollow fibres used in artificial lungs.
Cleaning solution for ultra-high-precision actuator.
How to be Utilized
Acids (hydrofluoric acid, hydrochloric acid, nitric acid, acetic acid, sulfuric acid and hydrogen peroxide) of various concentration.
Customised acid compounds (prepared to fit customer needs), conventional acid compounds (for cleaning ingots, alkaline cleaner, etching solution).
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